Titanium targets are key raw materials used in the physical vapor deposition (PVD) sputtering process. High-energy particles bombard their surfaces, sputtering titanium atoms or ions, forming a high-purity, high-performance titanium or titanium compound film on the substrate.
▸Core Features and Technical Specifications:
1. Ultra-High Purity: Available in varying purity levels, from 99.99% (4N) to 99.9999% (6N), these targets meet the stringent impurity requirements of various applications and ensure excellent conductivity, corrosion resistance, and biocompatibility.
2. Customizable Size and Weight: Fully customized production is supported. Maximum size and weight can be designed and manufactured to meet specific customer equipment chambers, process requirements, and sputtering power, providing maximum process flexibility.
3. Professional Packaging: Securely packaged in wooden crates or pallets, these high-value, high-precision targets are protected from damage, contamination, and deformation during transportation and storage, meeting industrial shipping standards.
▸Core Application Areas:
1. LCD Displays (Liquid Crystal Displays): Used for depositing electrodes (such as gate, source/drain) or barrier layers in thin-film transistor (TFT) arrays, which is crucial to display performance and yield.
2. Medical Devices and Implants: Used for depositing high-purity titanium or titanium nitride thin films on the surfaces of medical devices such as artificial joints, bone screws, dental implants, and cardiovascular stents, significantly improving the products' biocompatibility, wear resistance, corrosion resistance, and osseointegration.
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