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CRNMC offers high purity titanium materials in three grades: 5N (99.999%), 6N (99.9999%) and 7N (99.99999%). Using a proprietary molten salt electrolytic refining process combined with vacuum electron beam melting (EBM) technology, we achieve large-scale production of ultra-high purity titanium. As one of only four companies worldwide capable of industrial-scale production of ultra-high purity titanium, our products serve critical applications in semiconductor sputtering targets, aerospace, medical devices and chemical equipment.
| Purity Grade | Purity Value | Typical Impurity Content | Primary Applications |
|---|---|---|---|
| 5N | 99.999% | Total impurities < 10 ppm | Semiconductor sputtering targets, electronic evaporation materials, superalloys |
| 6N | 99.9999% | Total impurities < 1 ppm | Advanced chip manufacturing, precision optical coatings, nuclear components |
| 7N | 99.99999% | Total impurities < 0.1 ppm | Frontier research, quantum devices, ultra-high vacuum systems |
CRNMC employs a proprietary next-generation molten salt electrolytic refining process combined with vacuum electron beam melting (EBM) for large-scale production of ultra-high purity titanium. The molten salt electrolysis stage selectively removes transition metal impurities such as Fe, Ni and Cr through electrochemical reduction. The electron beam melting stage operates under high vacuum (< 10⁻³ Pa) to further eliminate gaseous impurities including O, N and H, yielding titanium ingots with exceptionally low impurity levels.
In semiconductor manufacturing, the purity of titanium sputtering targets directly impacts the resistivity and reliability of chip metal interconnect layers. 5N grade titanium targets meet the requirements for 28nm and above process nodes; 6N grade titanium targets are suitable for 14nm and below advanced processes, ensuring particle contamination remains below 10 particles per wafer (> 0.1μm) during thin film deposition.
| Product Form | Specification Range | Customizable Options |
|---|---|---|
| Sputtering Targets | Diameter 50-300mm | Purity grade, dimensions, bonding method |
| Evaporation Materials | Granules 1-5mm / Wire 0.5-3mm | Particle size distribution, shape, packaging |
| High Purity Ingots | Diameter 100-200mm | Weight, grain orientation, test reports |
| Titanium Alloy Billets | Per customer drawings | Alloy composition, heat treatment state |
From raw material procurement to finished product delivery, CRNMC maintains a comprehensive quality management system. Every batch is accompanied by ICP-MS full-element analysis reports covering 74 metal impurities and gas elements. For semiconductor-grade products, additional GDMS (Glow Discharge Mass Spectrometry) depth analysis reports are provided, ensuring impurity detection sensitivity reaches the ppb level.
As a core supplier in the global ultra-high purity titanium sector, CRNMC continuously invests in technological innovation and participates in or leads numerous national research projects. We customize dimensions, weights and purity specifications according to customer requirements, providing full-chain services from raw materials to finished components. Our professional team delivers comprehensive technical support across product design, manufacturing and after-sales maintenance.