When selecting a Titanium sputtering target, there are several factors to consider. We'll also discuss the advantages and disadvantages of various Titanium sputtering targets.
Customized Titanium sputtering targets are available
Titanium sputtering targets come in different sizes, purities, and prices. You can choose one that is suitable for your needs based on the material properties. Titanium is used in the manufacturing of many materials, including metal. Titanium sputtering targets are produced by an advanced hot isostatic pressing process. They are widely used in flat display coating, decorative coating, and semiconductor components. Unlike other metal targets, Titanium aluminum sputtering targets are homogeneous in microstructure.
Impurity content of Titanium target
The performance of sputtered films depends largely on the purity of a Titanium target. The higher the purity, the less impurity elements will be present in the film and the lower the probability of defects. Generally, titanium targets used for decorative coatings are not very demanding in terms of purity. However, for devices that require high-performance electronic components, such as integrated circuits and displays, the purity level is crucial. Impurity elements and porosity inclusions are the main sources of contamination in Titanium targets.
A high-quality Titanium target will minimize impurities and prevent abnormal discharge phenomena. It will also stabilize sputtering characteristics and inhibit particles during deposition. As a result, high-quality Titanium targets will be beneficial in forming thin films for electronic devices. Titanium targets have a Shore hardness of 20 or higher and a basal plane orientation ratio of 70% or less. They are also very durable, and they can sustain tensile test results of up to 2%.
Density of Titanium target affects electrical and optical properties
Optical and electrical properties of a target material depend on its densities. In the present study, we have examined the effect of the density of a Titanium target. The density of the target has been determined by measuring the resistivity of its surface at several points. The results of this study showed that the titanium film is much more dense than the surrounding air. The increase in density of the target explains this result.
It has been observed that target density has no effect on the deposition rate and structural properties, but it does affect the formation of the target nodules. The density of the target varies with the substrate temperature, and increasing the target density decreases the substrate's transmittance and resistivity in the visible spectrum. Further studies will reveal if the density of the target has an effect on the optical and electrical properties of the target.
Manufacturing method of
Titanium targetThe manufacturing method of Titanium target involves melting the raw titanium material and casting the molten soup to obtain a blank ingot. Once the billet has been cast, it undergoes a first heat treatment and a process called heat preservation. The next step involves a second heat treatment, which forms a second billet, which is then cold rolled. The process reduces grain size and hardness, and increases plasticity.
High quality Titanium target can reduce impurities, stabilize sputtering properties, and inhibit the formation of particles during the deposition process. Since the advent of semiconductor technology, countless electronic devices have been developed. As technology advances, these devices have become more sophisticated and useful. The manufacturing process of Titanium targets is critical in ensuring that these products are as good as possible. The process of sputtering and deposition enables the production of a variety of thin films, including those for electronic devices.
