High Purity Sputtering Target
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High Purity Sputtering Target

Views: 0     Author: Site Editor     Publish Time: 2024-04-15      Origin: Site


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The essence of sputtering as a deposition technique is its ability to transfer material from a solid source, known as a target, to a substrate to form a thin film. The purity of the sputtering target is paramount as it directly influences the quality and properties of the resulting film. High purity sputtering targets, boasting purities ranging from 99.9% to 99.9999%, are engineered to minimize contaminants that could otherwise compromise the performance of the thin film.

One critical aspect that sets high purity targets apart is their "low spit" characteristic. Spitting refers to the ejection of micro-sized particles from the target surface during sputtering, which can lead to defects in the thin film. Low spit targets undergo meticulous manufacturing processes and rigorous quality control measures to ensure minimal particle ejection, thereby enhancing film uniformity and integrity.


The advantages of utilizing high purity sputtering targets are multifaceted:

Enhanced Film Quality

The cornerstone benefit lies in their ability to produce films with superior quality. The high degree of purity ensures that unwanted impurities do not infiltrate the thin film, preserving its electrical, optical, and mechanical properties.

Extended Target Life

High purity materials exhibit lower rates of consumption during sputtering due to their dense and uniform microstructure. This translates into extended target life and reduced downtime for target replacement, optimizing production efficiency.

Versatility Across Applications

From precious metal alloys used in electronics and optoelectronics to specialized compounds for biomedical devices, high purity targets cater to a broad spectrum of applications demanding exacting standards.


While initial investment in high purity targets may be higher compared to standard options, their longer lifespan and ability to produce defect-free films translate into cost savings over time through reduced material wastage and enhanced product performance.


The innovation in high purity sputtering targets is not confined merely to improving purity levels; it extends into tailoring compositions for specific applications:

Electronics Industry

In an era where electronic devices continue shrinking while growing more powerful, high purity precious metal alloys such as gold (Au), silver (Ag), and platinum (Pt) play a crucial role in fabricating components with exceptional conductivity and reliability.

Renewable Energy Sector

For solar panels requiring thin films with optimal light absorption characteristics, high-purity copper indium gallium selenide (CIGS) targets provide an efficient pathway towards enhancing solar cell efficiency.

Biomedical Applications

Biocompatible coatings on medical devices are paramount for patient safety. High-purity titanium (Ti) targets offer excellent biocompatibility for implantable devices without compromising on durability or functionality.

Ningbo Chuangrun New Materials Co., Ltd.  (CRNMC) was established in June 2012 and has 4 production bases.

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