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Home / Media / What are the problems of ultra-high purity material titanium sputtering round target?

What are the problems of ultra-high purity material titanium sputtering round target?

Update:2023-03-09
Abstract:While ultra-high purity material titanium sputtering round targets offer many benefits in various in...
While ultra-high purity material titanium sputtering round targets offer many benefits in various industrial applications, there are a few potential problems that can arise:
High Cost: Ultra-high purity material titanium sputtering round targets are expensive to produce due to the high purity and quality of the materials used, which can result in higher production costs and prices for customers.
Brittleness: Titanium is a relatively brittle material, which can make it more prone to cracking or breaking during sputtering operations. This can result in increased downtime and production costs, as well as lower yields and efficiency.
Reactive: Titanium is a reactive material that can react with oxygen, nitrogen, and other gases in the environment, which can lead to contamination and reduced purity levels. Special handling and storage procedures may be required to minimize this risk.
Difficult to Fabricate: Ultra-high purity material titanium sputtering round targets are difficult to fabricate due to their high melting point, which can make it challenging to shape and form the material. Specialized manufacturing processes may be required to produce these targets with the required dimensions and specifications.
Limited Availability: Ultra-high purity material titanium sputtering round targets may be less readily available compared to other sputtering targets due to the complexity of the manufacturing process and the high demand for high-purity titanium in other industries.